Characteristics of TiO2 and Ag/TiO2 optical thin film by Co-sputtering method
نویسندگان
چکیده
منابع مشابه
Dry and Wet Wear Characteristic of TiO2 Thin Film Prepared by Magnetic Sputtering in Ringer Solution
In this research, a thin film of TiO2 was applied on AZ91D using the method of magnetic sputtering. Microstructure investigations were done using field emission scanning electron microscope (FESEM) and X-ray diffraction (XRD). Wear resistance for the coating was investigated using the pin on the disk in the form of dry and in the Ringer's solution. After this test, the worn surface of the sampl...
متن کاملPreparation and characterization of nanostructured S and Fe co-doped TiO2 thin film by ultrasonic-assisted spray pyrolysis method
Nanostructured TiO2 and S and Fe co-doped TiO2 thin films with high transparency were prepared on glass substrate through ultrasonic-assisted spray pyrolysis technique. The effects of doping on morphological, optical an...
متن کاملDEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
متن کاملJump method for optical thin film design.
This paper proposes a method called Jump method for optimization of optical thin films. The method is the combination of local search strategy using modified Coordinate-Wise Algorithm and global search strategy using modified Evolutionary Algorithm. Jump method can evolve the designs of optical thin films for good performances. The design of a dielectric beam splitter and an edge filter as exam...
متن کاملThe Effect of Substrate on Structural and Electrical Properties of Cu3N Thin Film by DC Reactive Magnetron Sputtering
The aim of this paper is to study the effect of substrate on the Cu3N thin films. At first Cu3N thin films are prepared using DC magnetron sputtering system. Then structural properties, surface roughness, and electrical resistance are studied using X-ray diffraction (XRD), the atomic force microscope (AFM) and four-point probe techniques respectively. Finally, the results are investigated and c...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Korean Journal of Optics and Photonics
سال: 2005
ISSN: 1225-6285
DOI: 10.3807/kjop.2005.16.2.168